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Picosun - Atomic Layer Deposition
-May 2nd, 2012
Picosun Newsletter Summer 2012 available for download
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-March 27th, 2012
A*STAR Institute of Microelectronics and Picosun announce a joint initiative to develop advanced Atomic Layer Deposition technology for next generation memories and solar cells
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-February 16th, 2012
PICOSUN™ P-300B ALD batch reactor achieves record particle levels and uniformities at Fraunhofer IPMS
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-February 9th, 2012
His Excellency The President of The Portuguese Republic Aníbal Cavaco Silva visits Picosun.
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Picosun develops and manufactures Atomic Layer Deposition (ALD) tools for micro- and nanotechnology
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PICOSUN™ R-series Atomic Layer Deposition (ALD) systems are optimized for research, product development and pilot production. The versatile reactor design enables deposition on 2-8’’ (50-200 mm) wafers, 3-dimensional objects and porous substrates. Read more PICOSUN™ P-series Atomic Layer Deposition (ALD) systems set a new standard for ALD production tools, providing extremely fast process times and very low cost of ownership with the patented design solely based on the requirements of the ALD method. Read more
R-series publications lists scientific papers where PICOSUN™ R-series Atomic Layer Deposition (ALD) reactors have been used as a part of the research work. Read more Our products Frequently Asked Questions section contains relevant information about the whole Picosun Atomic Layer Deposition (ALD) equipment product portfolio. Read more