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Picosun - Atomic Layer Deposition
-December 31st, 2011
ALD to enable novel, high efficiency silicon nanorod solar cells
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-December 23rd, 2011
Picosun Newsletter December 2011
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-November 30th, 2011
Picosun introduces several industrially scalable ALD processes
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-October 25th, 2011
Picosun introduces next generation of PICOPLATFORM™ ALD cluster tool
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-September 27th, 2011
Picosun reports breakthrough in ALD technology for advanced corrosion protection
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-August 29th, 2011
Picosun boosts ALD's breakthrough to yet more novel application areas by several new research projects
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More news
Picosun develops and manufactures Atomic Layer Deposition (ALD) tools for micro- and nanotechnology
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PICOSUN™ R-series Atomic Layer Deposition (ALD) systems are optimized for research, product development and pilot production. The versatile reactor design enables deposition on 2-8’’ (50-200 mm) wafers, 3-dimensional objects and porous substrates. Read more PICOSUN™ P-series Atomic Layer Deposition (ALD) systems set a new standard for ALD production tools, providing extremely fast process times and very low cost of ownership with the patented design solely based on the requirements of the ALD method. Read more
R-series publications lists scientific papers where PICOSUN™ R-series Atomic Layer Deposition (ALD) reactors have been used as a part of the research work. Read more Our products Frequently Asked Questions section contains relevant information about the whole Picosun Atomic Layer Deposition (ALD) equipment product portfolio. Read more