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| PICOSUN™ R-series Atomic Layer Deposition (ALD) systems are optimized for research, product development and pilot production. The versatile reactor design enables deposition on 2-8’’ (50-200 mm) wafers, 3-dimensional objects and porous substrates. Read more |
PICOSUN™ P-series Atomic Layer Deposition (ALD) systems set a new standard for ALD production tools, providing extremely fast process times and very low cost of ownership with the patented design solely based on the requirements of the ALD method. Read more |
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| R-series publications lists scientific papers where PICOSUN™ R-series Atomic Layer Deposition (ALD) reactors have been used as a part of the research work. Read more |
Our products Frequently Asked Questions section contains relevant information about the whole Picosun Atomic Layer Deposition (ALD) equipment product portfolio. Read more |
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