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Picosun - Atomic Layer Deposition
-July 5th, 2010
Using Picosun’s ALD-systems, Nanexa creates new remedies for medical challenges
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-June 20th, 2010
Picosun launches automated ALD cluster system
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-June 8th, 2010
Picosun's order books up 280 %, turnover up 51%
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-April 19th, 2010
Picosun plays important part in revolutionizing recyclable packaging materials
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-March 23rd, 2010
Picosun and Aalto University partner in tailoring new materials for ALD applications
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-February 22nd, 2010
Picosun hires ALD specialists and adds to its advantage as thin film trailblazer
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-January 29th, 2010
Picosun introduces revolutionary sealed precursor cartridge
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More news
Picosun develops and manufactures Atomic Layer Deposition (ALD) tools for micro- and nanotechnology
SUNALE™ R-series Atomic Layer Deposition (ALD) systems are optimized for research, product development and pilot production. The versatile reactor design enables deposition on 2-8’’ (50-200 mm) wafers, 3-dimensional objects and porous substrates. Read more SUNALE™ P-series Atomic Layer Deposition (ALD) systems are fast and reliable compact size reactors for production purposes. The reactor design is optimized for efficient processing of 4-6’’ wafer batches (25 wafers). Performance of the ALD tool can be maximized with the use of a robotic handler. Read more
R-series publications lists scientific papers where SUNALE™ R-series Atomic Layer Deposition (ALD) reactors have been used as a part of the research work. Read more Our products Frequently Asked Questions section contains relevant information about the whole Picosun Atomic Layer Deposition (ALD) equipment product portfolio. Read more