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Picosun - Atomic Layer Deposition
Worldwide ALD equipment manufacturer
June 9th, 2009
2009 Picosun World Forum starts today
May 14th, 2009
Picosun wins public tender to integrate glove box with ALD system at Lund university
April 1st, 2009
Berkeley Microlab installs and qualifies Picosun SUNALETM ALD reactor
March 17th, 2009
Picosun opens new laboratory, R&D and production facility
February 9th, 2009
Picosun part of project to dramatically increase the efficiency of solar cells
 
More news
Picosun develops and manufactures Atomic Layer Deposition (ALD) tools for micro- and nanotechnology
SUNALE™ R-series Atomic Layer Deposition (ALD) systems are optimized for research, product development and pilot production. The versatile reactor design enables deposition on 2-8’’ (50-200 mm) wafers, 3-dimensional objects and porous substrates. Read more SUNALE™ P-series Atomic Layer Deposition (ALD) systems are fast and reliable compact size reactors for production purposes. The reactor design is optimized for efficient processing of 4-6’’ wafer batches (25 wafers). Performance of the ALD tool can be maximized with the use of a robotic handler. Read more
R-series publications lists scientific papers where SUNALE™ R-series Atomic Layer Deposition (ALD) reactors have been used as a part of the research work. Read more Our products Frequently Asked Questions section contains relevant information about the whole Picosun Atomic Layer Deposition (ALD) equipment product portfolio. Read more