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Picosun - Atomic Layer Deposition
-January 29th, 2010
Picosun introduces revolutionary sealed precursor cartridge
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-December 17th, 2009
Picosun chooses dpUNION as its distribution partner in Brazil
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-December 8th, 2009
Picosun and Ångström Laboratory in Uppsala, Sweden partner in ALD
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-November 30th, 2009
Picosun launches 200 mm batch production ALD system
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-November 17th, 2009
Picosun tops previous 12 month sales record in six months
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-September 30th, 2009
Picosun contributes to new world record in X-ray microscopy
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-August 28th, 2009
Picosun fiscal Q1 sales break previous company records
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More news
Picosun develops and manufactures Atomic Layer Deposition (ALD) tools for micro- and nanotechnology
SUNALE™ R-series Atomic Layer Deposition (ALD) systems are optimized for research, product development and pilot production. The versatile reactor design enables deposition on 2-8’’ (50-200 mm) wafers, 3-dimensional objects and porous substrates. Read more SUNALE™ P-series Atomic Layer Deposition (ALD) systems are fast and reliable compact size reactors for production purposes. The reactor design is optimized for efficient processing of 4-6’’ wafer batches (25 wafers). Performance of the ALD tool can be maximized with the use of a robotic handler. Read more
R-series publications lists scientific papers where SUNALE™ R-series Atomic Layer Deposition (ALD) reactors have been used as a part of the research work. Read more Our products Frequently Asked Questions section contains relevant information about the whole Picosun Atomic Layer Deposition (ALD) equipment product portfolio. Read more