"The fact that Picosun has been involved in the ALD industry since its infancy speaks volumes about their technical expertise and the learning curve that's gone into designing the tool."
" I would recommend the PICOSUN™ R-series platform to any academic or national laboratory looking to do thin film research. Operationally, the system is both flexible and robust enough to meet the demands of a highly technical, multiple user facility."
Mr. Bryant Colwill, Rensselaer Polytechnic Institute, Troy, New York, USA
PICOSUN™ R-系列原子层沉积（ALD）系统专门针对研究、生产开发和试生产进行优化。用途广泛的反应器设计使 2-8’’（50-200 毫米）的晶片、三维物体，以及多孔基片上均可进行沉积。了解更多