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Picosun is an international equipment manufacturer with
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Automatic cassette-to-cassette loading production system up to 300 mm

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Press, News & Events

Apr 9, 2013

ESPOO, Finland, 9th April, 2013 – Picosun Oy, leading Atomic Layer Deposition (ALD) equipment manufacturer, reports that its PICOPLATFORM™ 300 ALD cluster tool has been selected by a key customer in Asia for new memory applications. The 300 mm cluster design is based on the company’s long-term top product, the fully automated, multifunctional PICOPLATFORM™ ALD deposition unit for parallel, simultaneous execution of several different processes for high-k and metal/metal nitride films.
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Mar 5, 2013

ESPOO, Finland, 5th March, 2013 – Picosun Oy, leading Atomic Layer Deposition (ALD) equipment manufacturer, and VTT Technical Research Centre of Finland report notable progress in continuous ALD technology. The water vapour and oxygen transmission rates measured from polymer films coated with thin ALD Al2O3 layer in Picosun’s new roll-to-roll ALD deposition chamber were on a par with the values obtained with similar coating in a batch ALD process, thus proving Picosun’s design for continuous ALD solution the frontrunner in producing barrier films on flexible substrates – one of the most sought-after ALD applications of today.
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WHAT IS ALD?

  

PICOSUN R-SERIES -
POWERING UP R&D 

  

PICOSUN P-SERIES -
DEFINING THE ALD PRODUCTION
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Atomic Layer Deposition (ALD) is an advanced thin film coating method which is used to fabricate ultrathin, highly uniform and conformal material layers for several applications.

 

PICOSUN™ R-series Atomic Layer Deposition (ALD) systems are optimized for research, product development and pilot production. The versatile reactor design enables deposition on 2-8’’ (50-200 mm) wafers, 3-dimensional objects and porous substrates.

 

PICOSUN™ P-series Atomic Layer Deposition (ALD) systems set a new standard for ALD production tools, providing extremely fast process times and very low cost of ownership with the patented design solely based on the requirements of the ALD method.

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