Press, News & Events

Mar 31, 2014: Picosun and Bosch team up in ALD

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Feb 26, 2014: Industrial robotics boost Picosun’s production ALD systems

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Jan 22, 2014: Picosun develops ALD for graphene-based displays and electronics

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WHAT IS ALD?

Atomic Layer Deposition (ALD) is an advanced thin film coating method which is used to fabricate ultrathin, highly uniform and conformal material layers for several applications.

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PICOSUN R-SERIES -
POWERING UP R&D 

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PICOSUN™ R-series Atomic Layer Deposition (ALD) systems are optimized for research, product development and pilot production. The versatile reactor design enables deposition on 2-8’’ (50-200 mm) wafers, 3-dimensional objects and porous substrates.

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PICOSUN P-SERIES -
DEFINING THE ALD PRODUCTION

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PICOSUN™ P-series Atomic Layer Deposition (ALD) systems set a new standard for ALD production tools, providing extremely fast process times and very low cost of ownership with the patented design solely based on the requirements of the ALD method.

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