"We are impressed with the excellent customer support provided by Picosun, the excellent quality of our PICOSUN™ ALD system, and its simple, clear, intuitive, and secure software. We have installed our PICOSUN™ system at our university and we would recommend it to any academic institute carrying out cutting-edge research in nanotechnology and related areas. This is the smallest PICOSUN™ system. For production purposes one should consider a bigger PICOSUN™ system with options for automated operation."Prof. Peter Lemmens and Dr. Andrey Bakin, University of Technology in Braunschweig, Germany
PICOSUN™ R-series Atomic Layer Deposition (ALD) systems are optimized for research, product development and pilot production. The versatile reactor design enables deposition on 2-8’’ (50-200 mm) wafers, 3-dimensional objects and porous substrates.
PICOSUN™ P-series Atomic Layer Deposition (ALD) systems set a new standard for ALD production tools, providing extremely fast process times and very low cost of ownership with the patented design solely based on the requirements of the ALD method.