“I have known Picosun for about eight years, and I have always been impressed with this company. They have a real enthusiasm and commitment to ALD, and the staff is open and friendly and easy-going. I would recommend the PICOSUN™ R-series tool to any researcher in the field of ALD.”
“I am always confident of the support I will get from Picosun.“
Prof. Seán Barry, Carleton University, Ottawa, Canada
PICOSUN™ R-series Atomic Layer Deposition (ALD) systems are optimized for research, product development and pilot production. The versatile reactor design enables deposition on 2-8’’ (50-200 mm) wafers, 3-dimensional objects and porous substrates.
PICOSUN™ P-series Atomic Layer Deposition (ALD) systems set a new standard for ALD production tools, providing extremely fast process times and very low cost of ownership with the patented design solely based on the requirements of the ALD method.