Picosun offers a flexible system with a reaction chamber which design is excellent for our wide variety of substrates. The system is reliable, their support is great and there is lots of knowledge about ALD in the company. I would recommend Picosun to anyone who is looking for a research or production ALD system.
Dr. Mårten Rooth, Nanexa, Sweden
PICOSUN™ R-series Atomic Layer Deposition (ALD) systems are optimized for research, product development and pilot production. The versatile reactor design enables deposition on 2-8’’ (50-200 mm) wafers, 3-dimensional objects and porous substrates.
PICOSUN™ P-series Atomic Layer Deposition (ALD) systems set a new standard for ALD production tools, providing extremely fast process times and very low cost of ownership with the patented design solely based on the requirements of the ALD method.