The good performance of Picosun’s ALD technology is well-known and trusted. We learned about Picosun through our industrial co-workers in LED manufacturing and the high technological quality and great achievements of the PICOSUN™ ALD systems motivated us to select one ourselves.
Picosun’s ALD equipment have demonstrated remarkable and reliable performance for electronic devices and optoelectronics production which is why we greatly recommend the semiconductor industries (for example Si-based FinFET, CMOS, LED, and display manufacturers) to consider PICOSUN™ ALD systems.
Professor Hao-Chung Kuo, National Chiao Tung University (NCTU), Taiwan
PICOSUN™ R-series Atomic Layer Deposition (ALD) systems are optimized for research, product development and pilot production. The versatile reactor design enables deposition on 2-8’’ (50-200 mm) wafers, 3-dimensional objects and porous substrates.
PICOSUN™ P-series Atomic Layer Deposition (ALD) systems set a new standard for ALD production tools, providing extremely fast process times and very low cost of ownership with the patented design solely based on the requirements of the ALD method.