News & Events 200812.12.2008: Helsinki Times Identifies Picosun As One Of Three Most Promising Nanotech Companies In Finland
Helsinki, Finland – December 12th, 2008 – English speaking weekly newspaper Helsinki Times identifies leading Atomic Layer Deposition (ALD) systems manufacturer Picosun Oy as one of three most promising nanotechnology companies in Finland.
13.08.2008: Picosun register record sales for its SUNALE™ ALD reactor systems
Otaniemi Campus, Espoo, FINLAND – August 13, 2008 – Following roaring success at AVS ALD 2008, the 8 th International Conference on Atomic Layer Deposition held in Bruges, Belgium in early July, Picosun Oy, the Finnish Atomic Layer Deposition ( ALD ) reactor manufacturer reports record sales for its SUNALE™ ALD reactor systems.
04.07.2008: Picosun package gather big interest at ALD 2008 Conference in Bruges , Belgium
Otaniemi Campus, Espoo , FINLAND – July 4, 2008 – AVS ALD 2008, the 8 th International Conference on Atomic Layer Deposition held in Bruges , Belgium , became a convincing step forward for Picosun Oy, the Finnish Atomic Layer Deposition ( ALD ) reactor manufacturer.
30.06.2008: Picosun re-introduces Tuomo Suntola, inventor of ALD at ALD 2008 conference
BRUGES, BELGIUM – June 30, 2008 - At AVS ALD 2008, the 8th International Conference on Atomic Layer Deposition held in Bruges, Belgium, Finnish Atomic Layer Deposition (ALD) reactor manufacturer Picosun Oy today re-introduced Dr Tuomo Suntola, Finnish scientist who received the European SEMI award in 2004 for inventing the ALD method, to a whole new generation of ALD-enthusiasts.
03.06.2008: Picosun’s SUNALE™ ALD reactors to three leading American universities
BOSTON, USA – June 3, 2008 - At the 2008 NSTI Nanotechnology Conference and Trade Show held in Boston, Massachusetts, Finnish Atomic Layer Deposition (ALD) reactor manufacturer Picosun Oy today announced three new orders for its flagship SUNALE™ R-series Advanced ALD research reactors from three leading U.S. universities.
17.04.2008: Picosun and Tohoku University announce their co-operation in Atomic Layer Deposition
HELSINKI, Finland and SENDAI, Japan – April 17, 2008 - Picosun Oy, Finland and Tohoku University, Japan announce their collaboration in the field of Atomic Layer Deposition (ALD).
|December 3rd, 2008 - December 5th, 2008||RUSNANOTECH 2008, Central Exhibition Complex Expocenter, Moscow, Russia|
|October 7th, 2008 - October 9th, 2008||Semicon Europe 2008, Stuttgart Trade Fair Centre, Stuttgart, Germany|
|September 23rd, 2008 - September 25th, 2008||Nanotech Northern Europe 2008, Bella Centre, Copenhagen, Denmark|
|June 29th, 2008 - July 2nd, 2008||AVS ALD 2008, Bruges, Belgium|
|February 13th, 2008 - February 15th, 2008||Nanotech 2008, Tokyo, Japan|