News 2010
23.12.2010: Picosun predicts industrial breakthrough for ALD in 2011ESPOO, Finland, December 23rd, 2010 – Picosun Oy, Finland-based global manufacturer of state-of-the-art Atomic Layer Deposition (ALD) systems predicts 2011 to become a year of major breakthroughs for many industrial scale applications of ALD.
10.11.2010: Picosun develops ALD-enhanced processes for chemical and pharmaceutical industries
Espoo Finland, November 10th, 2010 – Picosun Oy, Finland-based global manufacturer of state-of-the-art Atomic Layer Deposition (ALD) systems, takes part in Polycat, a major 2010 -2014 EU funded research project aiming at reducing the environmental footprint of chemical and phar-maceutical industries by studying methods towards creating zero-waste processes.
27.10.2010: Picosun’s batch production ALD system delivered to Sensonor
Espoo Finland, October 27th, 2010 – Picosun Oy, Finland-based global manufacturer of state-of-the-art Atomic Layer Deposition (ALD) systems announced having installed the first of its new series of SUNALE™ P-300B ALD batch systems at Sensonor’s wafer fab in Horten, Norway, where it will be used in the production of microbolometer sensors used for thermal imaging.
19.10.2010: Picosun organizes first ever scientific ALD meeting in China
ESPOO Finland and SHANGHAI China, October 19th 2010 – Picosun Oy, Finland-based global manufacturer of state-of-the-art Atomic Layer Deposition (ALD) systems, together with Fudan University, Picosun’s Chinese distributor Beijing Honoprof, Shanghai Institute of Technical Physics of the Chinese Academy of Sciences, Nanjing University, and National Engineering Research Center for Nanotechnology organized the very first scientific ALD meeting ever held in China on Monday and Tuesday at the Lansheng hotel in Shanghai.
16.10.2010: Picosun at Shanghai World Expo in China
ESPOO Finland and SHANGHAI China, October 16th 2010 - Picosun Oy, Finland-based global manufacturer of state-of-the-art Atomic Layer Deposition (ALD) systems was the only nanotech company presenting itself to a wide variety of Chinese companies, investors and public authorities in the field of clean technologies, at the Cleantech Finland Smart Days Seminar at Shanghai World Expo on Friday.
24.09.2010: Picosun’s Niinistö receives first GerALD award
ESPOO, Finland 24 September 2010 - Professor Lauri Niinistö, Member of the Board of Directors of Picosun, was honoured with the first ever GerALD -award at the 2010 Baltic ALD conference, which was held in Hamburg, Germany from September 16 to September 17.
30.08.2010: Picosun’s Q1 orders up by 400%
ESPOO, Finland, August 30th, 2010 – Picosun Oy, Finland-based global manufacturer of state-of-the-art Atomic Layer Deposition (ALD) systems today announced a 400 % increase in new orders received during its fiscal Q1 (May to July 2010) on a year-on-year basis.
05.07.2010: Using Picosun’s ALD-systems, Nanexa creates new remedies for medical challenges
ESPOO, Finland and UPPSALA, Sweden, July 5, 2010 – Picosun Oy, Finland-based global manufacturer of state-of-the-art Atomic Layer Deposition (ALD) systems highlighted today the results obtained by the Swedish nanotechnology company Nanexa, using Picosun’s SUNALE™ ALD systems.
20.06.2010: Picosun launches automated ALD cluster system
ESPOO, Finland, and SEOUL, the Republic of Korea, June 20th, 2010 – Picosun Oy, Finland-based global manufacturer of state-of-the-art Atomic Layer Deposition (ALD) systems today launched its latest ALD systems product, Picoplatform™, in connection with the 10th International Conference on Atomic Layer Deposition, which was opened today in Seoul, the Republic of Korea.
08.06.2010: Picosun’s order books up 280 %, turnover up 51%
ESPOO, Finland, June 8th, 2010 – Picosun Oy, Finland-based global manufacturer of state-of-the-art Atomic Layer Deposition (ALD) systems today opened its II Global World Forum and announced having achieved its fourth consecutive profitable fiscal year from May 2009 to April 2010.
19.04.2010: Picosun plays important part in revolutionizing recyclable packaging material
ESPOO, Finland, April 19th, 2010 – VTT Technical Research Centre of Finland has developed a fully recyclable new packaging material which, among other things, is able to replace many if not most aluminium-based packaging materials such as blister-packs for pharmaceutical pills or material used for packing coffee for consumers. The secret behind the new discovery is ALD (Atomic Layer Deposition).
23.03.2010: Picosun and Aalto University partner in tailoring new materials for ALD application
ESPOO, Finland, March 23rd, 2010 – Picosun Oy, Finland-based global manufacturer of state-of-the-art Atomic Layer Deposition (ALD) systems today announced having sold a Picosun SUNALE™ R-100 reactor to Finnish Aalto University to modernize its fleet of ALD reactors.
22.02.2010: Picosun hires ALD specialists and adds to its advantage as thin film trailblazer
ESPOO, Finland, February 22nd, 2010 – Picosun Oy, Finland-based global manufacturer of state-of-the-art Atomic Layer Deposition (ALD) systems today introduced a newly appointed group of ALD specialists.
29.01.2010: Picosun introduces revolutionary sealed precursor cartridge
ESPOO, Finland, January 29, 2010 – Picosun Oy, Finland-based global manufacturer of state-of-the-art Atomic Layer Deposition (ALD) systems today introduced a novel sealed precursor cartridge which will revolutionize precursor handling and lower the running costs of ALD systems significantly.
Events 2010
| September 16-17, 2010 | BalticALD 2010 and GerALD 2 in Hamburg, Germany |
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