PICOFLOW™ diffusion enhancer


PICOFLOW™ system is used for increasing retention time of the precursors in the reaction chamber by slowing down the speed with which the reactant gases are pumped out from the reactor. This enables and improves the coating of challenging through-porous, highly tortuous, nanoporous, powderous or otherwise nano-scale complicated structures by allowing the precursors more time to diffuse in and interact with the surface to be coated. PICOFLOW™ diffusion enhancer system enables coating of extremely high aspect ratio samples without a risk of back-diffusion of the precursors into the inlet lines.