PICOPLATFORM™ vacuum cluster tools
Picosun’s PICOPLATFORM™ vacuum cluster tools combine the unique scalability and modularity of all PICOSUN™ ALD systems with fully standardized automation solutions for high volume manufacturing with world leading process quality.
The PICOPLATFORM™ system consists of several ALD reactors clustered around a central vacuum robot loading and controlling unit for automatic wafer handling without vacuum break. The system can also be extended at any time by clustering with other process units such as pre/post treatment and deposition modules. Depending on your application and production needs, the PICOPLATFORM™ cluster system product line offers two alternatives.
PICOPLATFORM™ 200 vacuum cluster is ideal for R&D and smaller scale production.
PICOPLATFORM™ 300 vacuum cluster is optimized for fully automated high throughput industrial manufacturing.
The substrate handling system of the PICOPLATFORM™ 200 tool is based on the Brooks MX400™ or MX700™ vacuum robot clustering unit. The PICOPLATFORM™ 200 cluster system comprises PICOSUN™ R-200 Advanced or PICOSUN™ P-200 Pro ALD tools and other, optional process modules. It is compatible with SEMI standards for automatic handling of 200 mm wafers, and it can be used as 100/200 mm bridge tool.
The substrate handling system of the PICOPLATFORM™ 300 tool is based on the Brooks Marathon 2™ vacuum robot clustering unit and a FOUP loading station to enable automatic wafer transfer between the wafer carrier FOUPs and clustered process modules without vacuum break. The PICOPLATFORM™ 300 cluster system comprises PICOSUN™ P-300 Pro ALD tools and other, optional process modules. It is compatible with SEMI standards for automatic handling of 300 mm wafers, and it can be used as 200/300 mm bridge tool.
Follow the links below for technical features of the PICOPLATFORM™ ALD systems:
PICOPLATFORM™ 200 technical features
PICOPLATFORM™ 300 technical features
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