PICOSUN™ P-series Atomic Layer Deposition (ALD) systems
PICOSUN™ P-series Atomic Layer Deposition (ALD) systems set a new standard for ALD production tools, providing extremely fast process times and very low cost of ownership with the patented design solely based on the requirements of the ALD method. The reactor design is optimized for efficient processing of batches of 4-18" (100-450 mm) or 156 mm x 156 mm solar wafers and glass substrates up to 460 mm x 640 mm with high throughput that fulfills HVM requirements for both for electronics manufacturing and solar applications. PICOSUN™ P-series ALD tools are reliable, have a small footprint and are fully compatible with the most stringent clean room processing requirements. Operation and maintenance of the PICOSUN™ P-series ALD tools is fast and simple. Excellent particle performance and short cycle times can be reached thanks to the unique batch chamber design. Performance of the ALD system can be maximized with automated loading systems. PICOSUN™ P-series ALD systems have been selected by production customers on three continents.