PICOSUN™ R-series Atomic Layer Deposition (ALD) reactors

PICOSUN™ R-series Atomic Layer Deposition (ALD) reactors are optimized for research, product development and pilot production. The versatile reactor design enables deposition on 2-8'' (50-200 mm) wafers, 3-dimensional objects and porous substrates. Reaction chamber materials are selected to withstand corrosive process chemistries. The process tools can be upgraded with various precursor source, reactor chamber and substrate loader options, as well as an ozone delivery system, plasma or a nitrogen generator.

R-200 Standard technical data sheet
R-200 Advanced technical data sheet

PICOSUN™ R-series ALD process tools publications

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PICOSUN(TM) R-200 Standard ALD tool       PICOSUN(TM) R-200 Advanced ALD tool