Manual or semi-automatic processing for research and development
High standard R&D requires the best equipment. PICOSUN™ R-series ALD tools enable the deposition of the highest quality ALD films with excellent uniformity even on the most challenging through-porous, ultra-high aspect ratio, and nanoparticle samples. Highly functional and easily exchangeable precursor sources for liquid, gaseous, and solid chemicals enable particle-free processing of a wide range of materials on wafers, 3D objects, and all nanoscale features.
The unique scalability of the PICOSUN™ R-series tools enables smooth transition of the research results into production with PICOSUN™ P-series ALD systems.
Customer data showing excellent film thickness uniformities achieved on 150/200 mm (6/8”) wafers in PICOSUN™ R-series ALD tools. PEALD = plasma-enhanced ALD process.
|PEALD SiO2 (low-T)
Follow the links below for technical features of the PICOSUN™ R-series ALD systems:
PICOSUN™ R-200 Standard technical features
PICOSUN™ R-200 Advanced technical features
For further information and quote please contact firstname.lastname@example.org.