January 2nd, 2006
Picosun Oy reports today that the production of gamma level SUNALE™ R-series ALD tools has started. First deliveries to customers are scheduled for Q2, 2006.
In making the announcement, Juhana Kostamo, COO of Picosun Oy, commented: "The design of our ALD reactors has matured to the gamma level which enables us to start high volume manufacturing of SUNALE™ R-series ALD tools.
Judging from the positive customer feedback from our earlier alpha and beta level reactors this has given us a competitive edge in the markets for ALD research reactors.
While the customer interest is staying strong, we are now drastically scaling up our production. This, together with the optimized production processes, enables us to significantly lower our production costs, which will turn to the benefit of our customers."
SUNALE™ R-series ALD reactors are optimized for Atomic Layer Deposition method especially for MEMS and nanotechnology research and application development purposes.
Gamma level SUNALE™ R-series ALD reactors can be equipped with temperature stabilized Picosolution™ liquid sources, ventilated Picogases™ gas cabinets, proprietary new type Picosolid™ and Picosolid™ Booster solid sources for high and low vapour pressure solids and several different types of Picoloader™ load locks for manual, semi-automatic or fully automated cassette-to-cassette operation.
