November 15th, 2006
Picosun starts co-operation with ETH Zürich
Die Eidgenössische Technische Hochschule Zürich (ETH) and Finnish Atomic Layer Deposition (ALD) reactor manufacturer Picosun Oy announce their co-operation in Atomic Layer Deposition. SUNALE™ R-150 ALD reactor produced by Picosun Oy has been assembled in the FIRST lab at ETH Zürich and ETH Zürich has already accepted the reactor for their research on nanotechnology applications.
“I am very glad that the ETH Zürich, one of the most highly regarded research institutes in Europe, has purchased an ALD reactor from Picosun. I believe that the development of the whole ALD and nanotechnology industry benefits from our collaboration. It also opens a possibility for other industrial partners of ETH Zürich to benefit from the co-operation with Picosun in developing productive ALD applications. This helps in creating new high-tech business and jobs in Switzerland and Finland.” states Mr. Juhana Kostamo, Managing Director of Picosun Oy.
Please see the article of the ALD reactor (written in German).
You can find the picture and specifications of the installed reactor here.
For more information, please contact Dr. Ronald Grundbacher, Tel. +41 44 6323582 or Managing Director Juhana Kostamo, Tel. +358 50 3699 565.
