January 23rd, 2006
University of Helsinki announced that Picosun Oy's SUNALE™ R-150 ALD reactor has been installed and is performing well at the Laboratory of Inorganic Chemistry. In making the announcement, Professor Mikko Ritala commented:
"Picosun's SUNALE™ ALD reactor has now been successfully delivered and installed. The first test runs gave excellent results on 150 mm wafers. We are very excited about this latest addition to our ALD reactor portfolio. One interesting pathway in near future research will be a modification of the reactor with the new feature we have invented and further developed in collaboration with Picosun. This will add a new dimension to ALD processing."
SUNALE™ R-series ALD reactors are optimized for Atomic Layer Deposition method especially for MEMS and nanotechnology research and application development purposes.
Picosun Oy's SUNALE™ R-150 ALD reactor at University of Helsinki is equipped with the Advanced Control System for nanolaminate multilayer deposition and the proprietary Picosolid™ Heated Source System for solid and liquid low vapor pressure precursors.
For more information, please contact Professor Mikko Ritala, tel. +358 9 191 50 193 or COO Juhana Kostamo, tel. +358 50 3699 565.
