The AVS 17th International Conference on Atomic Layer Deposition (ALD 2017) is right behind the corner.
The event takes place in Sheraton Downtown Denver Hotel, Colorado, USA, from July 15 to 18. As a platinum sponsor of the conference, Picosun wishes to see you all in ALD 2017!
Visit the Picosun booth # 8-9 to hear the latest news and see the new products from the headquarters of AGILE ALD™. Remember also to fill our PicoSurvey™ questionnaire and participate in a lottery of an iPad.
If you wish to book a meeting with us, please contact firstname.lastname@example.org directly – we’re happy to help you in all your ALD requirements!
On Sunday evening July 16 at 7 pm it’s time for our special ALD 2017 hospitality event at The Pinnacle Club by Grand Hyatt Denver.
The event is hosted together with NSI, Air Liquide, Lam Research, and EMD Performance Materials. Invitations to the event are delivered at the Picosun booth. Be quick, as the invitations are personal and their amount is limited! Let’s relax after a hectic conference day with some great food, drinks, activities, and networking in informal atmosphere, all crowned by a spectacular 360º view over nighttime Denver!
This year, Picosun is happy to present total four speeches in the event.
The topics cover our latest breakthroughs in area-selective ALD, ALD of rare-earth oxides for semiconductor applications, advanced Li-ion battery materials by ALD, and the latest results achieved with our novel, spearheading PEALD technology. Bookmark the times in your calendar:
- Sun July 16, 2:15 pm: Mr. Edwin Wu: Evaluation of different nanoimprint resists for a use in area-selective atomic layer deposition of selected materials.
- Sun July 16, 5:15 pm: Mr. Jesse Kalliomäki: High quality SiN and SiO2 films produced by PEALD with microwave ECR plasma below 200 ºC.
- Tue July 18, 11:00 am: Dr. Erik Østreng: Nano‐ceramic composite separator modified by ALD for lithium ion batteries of improved safety and reliability.
- Tue July 18, 2:30 pm: Dr. Tero Pilvi: Surface morphology, crystallinity and electrical properties of some rare‐earth oxide ALD films.
Looking forward to seeing you in Denver!