ESPOO, Finland, 17th August, 2015 – Picosun Oy, leading supplier of Atomic Layer Deposition (ALD) thin film coating solutions for industrial production, delivers several new PICOPLATFORM™ cluster tools for high volume ALD manufacturing in semiconductor industries.
The PICOPLATFORM™ cluster systems have quickly become a favorite of Picosun’s production customers. The systems, designed to accommodate wafers up to 300 mm size, comprise Picosun’s state-of-the-art technological solutions and unparalleled ALD knowhow with the most extensive selection of vacuum loading solutions for single wafer and batch processing. This makes the PICOPLATFORM™ cluster tools ideal for e.g. III-V semiconductor, LED, and MEMS device manufacturing. The now sold PICOPLATFORM™ cluster tools will be installed in the production facilities of leading, multi-billion semiconductor device manufacturers in USA and Asia.
“The PICOPLATFORM™ product family is one of the strongholds of our industrial ALD technology. The repeat sales of these systems to our core markets such as microelectronic component and sensor manufacturing prove again the unmatched level of our ALD equipment design and our excellence in hardware integration, software, and process development. Combined with our leading selection of automated batch handling systems designed to fulfill the strictest requirements of the semiconductor industries, the PICOPLATFORM™ cluster systems offer the most comprehensive turn-key solutions to fast, productive, and cost-efficient ALD manufacturing,” states Mr. Juhana Kostamo, Managing Director of Picosun.
Picosun provides the most advanced ALD thin film technology and enables the industrial leap into the future by novel, cutting-edge coating solutions, with four decades of continuous expertise in the field. Today, PICOSUN™ ALD systems are in daily production use in numerous major industries around the world. Picosun is based in Finland, with subsidiaries in North America, China, Taiwan, Singapore, and Japan, and a world-wide sales and support network.