| SUNALE™ R-series Atomic Layer Deposition (ALD) reactors are optimized for research, product development and pilot production. The versatile reactor design enables deposition on 2-8’’ (50-200 mm) wafers, 3-dimensional objects and porous substrates. Read more |
SUNALE™ P-series Atomic Layer Deposition (ALD) systems are fast and reliable compact size reactors for production purposes. The reactor design is optimized for efficient processing of 4-6’’ wafer batches (25 wafers). Performance of the ALD tool can be maximized with the use of a robotic handler. Read more |
