V2019 Vakuum & Plasma

Read more: https://www.efds.org/v2019/

NOTE: ALD WORKSHOP with keynote lecture by Dr. Tuomo Suntola, Picosun Board member and the winner of the 2018 Millennium Technology Prize:

Wednesday, 09.10.2019, 14:00 – 18:00 (hall 3)
Thursday, 10.10.2019, 09:00 – 12:30 (hall 3)

Wednesday, 09.10.2019, 14:00 – 15:30

Poster Session:
Wednesday, 09.10.2019, 15:00 – 16:00

“Atomic Layer Deposition (ALD) is used to deposit ultraconformal thin films with sub-nm film thickness control. The method is unique in the sense that it employs sequential self-limiting surface reactions for growth in the monolayer thickness regime. During this workshop specially ALD for optical and medical applications will be addressed beside others.”