The PICOSUN® Sprinter ALD system is designed to disrupt batch ALD production in 300 mm manufacturing lines in the semiconductor (e.g. emerging memory, transistor, capacitor), display, and IoT component industries. In Sprinter, barrier, high-k oxide, and other films are deposited with perfect ALD in mass production volumes.
Fully automated, SEMI S2/S8-certified PICOSUN® Sprinter combines the leading single wafer film quality and uniformity with fast processing, high throughput, and uncompromising reliability.
The core of PICOSUN® Sprinter is its disruptively designed reaction chamber, where fully laminar precursor flows ensure perfect ALD deposition with no parasitic CVD growth. This minimizes the need for system maintenance.
Compared to vertical furnace reactors typically used for batch ALD processing, Sprinter provides higher film quality with lower thermal budget, so it is suitable also for temperature-sensitive devices.
Sprinter combines very fast process times with smaller batch sizes than in vertical furnaces, which allows greater production flexibility and minimized risk without sacrificing throughput.
The tool has also demonstrated record-breaking batch film quality.
The standard Sprinter cluster configuration consists of two ALD modules, a central wafer-handling robot with pre-heating and cooling chambers, and an EFEM station to load/unload wafers from/to the FOUPs. Sprinter can also be purchased as a standalone module ready to be integrated into an existing manufacturing line or cluster.
PICOSUN® Sprinter is made in Finland with European vacuum robotics and process modules.
The product development work for PICOSUN® Sprinter has received funding from the European Union’s Horizon 2020 research and innovation programme R3-PowerUP under grant agreement No. ECSEL 737417.
PICOSUN MAIN HEADQUARTERS Tietotie 3, FI-02150 Espoo Finland Tel. +358 50 321 1955
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© Copyright 2021 Picosun Oy. Picosun is a trademark or registered trademark of Picosun Oy | Privacy Statement