The PICOSUN® Sprinter ALD system is designed to disrupt batch ALD production in 300 mm manufacturing lines in the semiconductor (e.g. emerging memory, transistor, capacitor), display, and IoT component industries. In Sprinter, barrier, high-k oxide, and other films are deposited with perfect ALD in mass production volumes.
Fully automated, SEMI S2/S8-certified PICOSUN® Sprinter combines the leading single wafer film quality and uniformity with fast processing, high throughput, and uncompromising reliability(*).
Compared to vertical furnace reactors typically used for batch ALD processing, Sprinter provides higher film quality with lower thermal budget, so it is suitable also for temperature-sensitive devices.
Sprinter combines very fast process times with smaller batch sizes than in vertical furnaces, which allows greater production flexibility and minimized risk without sacrificing throughput.
The core of the Sprinter is its disruptively designed reaction chamber, where fully laminar precursor flows ensure perfect ALD deposition with no parasitic CVD growth. This minimizes the need for system maintenance.
The PICOSUN® Sprinter ALD module can be integrated to customer’s manufacturing line or cluster. It is suitable also for single wafer manufacturing lines as it does not disturb the process flow. Sprinter is run with Picosun’s new, proprietary PicoOS™ operating system and process control software.
PICOSUN® Sprinter is made in Finland with European vacuum robotics and process modules.
The product development work for PICOSUN® Sprinter has received funding from the European Union’s Horizon 2020 research and innovation programme R3-PowerUP under grant agreement No. ECSEL 737417.