Picosun Sprinter

    PICOSUN® Sprinter

    The PICOSUN® Sprinter ALD system is designed to disrupt batch ALD production in 300 mm manufacturing lines in the semiconductor (e.g. emerging memory, transistor, capacitor), display, and IoT component industries. In Sprinter, barrier, high-k oxide, and other films are deposited with perfect ALD in mass production volumes.

    Fully automated, SEMI S2/S8-certified PICOSUN® Sprinter combines the leading single wafer film quality and uniformity with fast processing, high throughput, and uncompromising reliability.

    Technical Features

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    Typical substrate size and type
    • 300 mm wafers in batch for high throughput ALD
    • Double-side coating possible
    • High aspect ratio samples
    Typical processses
    Typical processes
    • Al2O3, SiO2, TiO2 and other metal oxides and nitrides
    icon-product-thermometer
    Processing temperature and capacity
    • Up to 400 °C
    • More than 100 wafers an hour @ 10 nm Al2O3 thickness
    PicoOS™ – operating system/process control software key features
    • Picosun’s own, proprietary, SEMI-compliant scheduler
    • One common interface to control the whole cluster
    • Data logged every 20 ms
    • Trend data can be exported
    • Access rights for different user levels
    • EtherCAT-based communication for MFCs and MFMs
    • Enhanced recovery features
    • One common event log for the whole cluster
    • Freely configurable and scalable recipe editor (no fixed number of steps and loops)
    • Recipes can be edited / created any time during system operation
    Precursors
    • Liquid, solid, gas, ozone
    • Level sensors available for precursor containers
    • Continuous dispenser for pyrophoric precursors available as option (delivering up to 4 tools)

    The core of the Sprinter is its disruptively designed reaction chamber, where fully laminar precursor flows ensure perfect ALD deposition with no parasitic CVD growth. This minimizes the need for system maintenance.

    Compared to vertical furnace reactors typically used for batch ALD processing, Sprinter provides higher film quality with lower thermal budget, so it is suitable also for temperature-sensitive devices.

    Sprinter combines very fast process times with smaller batch sizes than in vertical furnaces, which allows greater production flexibility and minimized risk without sacrificing throughput.

    The tool has also demonstrated record-breaking batch film quality.

    The standard Sprinter cluster configuration consists of two ALD modules, a central wafer-handling robot with pre-heating and cooling chambers, and an EFEM station to load/unload wafers from/to the FOUPs. Sprinter can also be purchased as a standalone module ready to be integrated into an existing manufacturing line or cluster.

    PICOSUN® Sprinter is made in Finland with European vacuum robotics and process modules.

    The product development work for PICOSUN® Sprinter has received funding from the European Union’s Horizon 2020 research and innovation programme R3-PowerUP under grant agreement No. ECSEL 737417.

    Product video

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