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    PICOSUN® R-200 Advanced

    The PICOSUN® R-200 Advanced ALD systems are suitable for R&D on dozens of applications such as IC components, MEMS devices, displays, LEDs, lasers, and 3D objects such as lenses, optics, jewelry, coins, and medical implants.

    Technical Features

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    Typical substrate size and type
    • 50-200 mm single wafers
    • 156 mm x 156 mm solar Si wafers
    • 3D objects
    • Powders and particles
    • Mini-batch
    • Porous, through-porous, and high aspect ratio (up to 1:2500)
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    Processing temperature and capacity
    • 50 – 500°C, plasma 450°C (650 °C with heated chuck on request)
    Typical processes
    • Al2O3, TiO2, SiO2, Ta2O5, HfO2, ZnO, ZrO2, AlN, TiN, metals such as Pt or Ir
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    Substrate loading
    • Manual loading with a pneumatic lift
    • Load lock with magnetic manipulator arm
    • Semi-automatic loading with handling robot
    • Cassette-to-cassette loading with cluster tools
    Precursors
    • Liquid, solid, gas, ozone, plasma(*)
    • Up to 12 sources with 6 separate inlets (7 if the plasma option is chosen)
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    Options
    • Cluster tools, Picoflow™ diffusion enhancer, roll-to-roll chamber, RGA, UHV compatibility, N2 generator, gas scrubber, customized designs, glove box integration for inert loading

    The PICOSUN® R-200 Advanced ALD system is the global market leader in advanced ALD research tools with hundreds of customer installations. It has become the tool of choice both for companies and research institutes driven by innovation.

    The agile design enables the highest quality ALD film depositions together with the ultimate system flexibility to fit future needs and applications. The patented hot-wall design with fully separate inlets and instrumentation enables particle-free processing adaptable on a wide range of materials on wafers, 3D objects, and all nanoscale features. Excellent uniformity even on the most challenging through-porous, ultra-high aspect ratio, and nanoparticle samples is achieved thanks to our proprietary Picoflow™ technology. The PICOSUN® R-200 Advanced systems are equipped with highly functional and easily exchangeable precursor sources for liquid, gaseous, and solid chemicals. Highly efficient and patented remote plasma option enables deposition of metals without the risk of short-circuiting or plasma damage. Integration with glove boxes, UHV systems, manual and automated loaders, cluster tools, powder chambers, roll-to-roll chambers, and various in situ analytics systems enable efficient and flexible research with good results no matter what your research area is now or might become later on.

    (*) Plasma generator technical features:

    • Remote plasma source mounted to the loading chamber with connection to the reaction chamber

    • Sapphire applicator for different chemistries at superior particle performance

    • Commercial microwave plasma generator with adjustable 300 – 3000 W power, 2.45 GHz frequency

    • Protective gas flow in the intermediate space (no back-diffusion of the plasma species)

    • Possibility to plasma and thermal ALD cycling during the same deposition run without hardware changes to the system

    • Following relevant standards were used for evaluation of compliance of the power supply: DIN EN ISO 12100:2011-03, DIN EN 60204-1:2007-06, DIN EN 61000-6-2:2006-03, DIN EN 61000-6-4:2011-09

    • The power supply has been developed and manufactured to meet the requirements stipulated in SEMI S2-0310

    Testimonials

    “Since I started working in the field of ALD I have always been positively surprised and satisfied by the response and availability of the Picosun team. We have a lot of exchange about the process parameters, the reactor parts, and the different possibilities offered by some specific precursors. At the beginning, Picosun team took time to properly explain all the details of the system and to recommend what equipment was the best for our purposes. It made us trust that the after sales service would also be up to our expectations. Moreover, the computer interface of the PICOSUN® ALD reactor is very intuitive, the handling of the reactor is simple and the precursor sources are easily accessible which makes their replacement quick and safe. I would recommend Picosun to all scientists and manufacturers who are interested in the ALD technology. The PICOSUN® ALD tool is very easy to use but at the same time powerful enough allowing one to master very complex processes.”
    Mr. David Grange
    Institute of Applied Microtechnologies, HE-Arc, La Chaux-de-Fonds, Switzerland
    “Obviously the Picosun ALD systems show a high degree of design and engineering resulting in reliable systems. Also we have to mention Picosun’s customer service is second to none with prompt replies addressing the various (technical and process) issues we, as users, come up with. We would warmly recommend PICOSUN® ALD tools to our Australian colleagues in research institutes or in industry. We are confident that through our large user base the impact of the Picosun ALD on their research is also transmitted overseas through their collaborators and networks. One of the key advantages of PICOSUN® ALD systems is that the plasma and thermal depositions can be done in the same outfit without any hardware modifications. Moreover, the software is user friendly and it offers one of the most outstanding features, namely the boost function to be used particularly with high aspect ratio nanostructures.”
    Dr. Kaushal Vora and Dr. Fouad Karouta
    The Australian National University
    “We have chosen an ALD system from Picosun because of the possibility of its fulfillment in the UHV version”
    Dr. Andrey M. Markeev
    Moscow Institute of Physics and Technology, Moscow, Russia
    “In the past five years, our PICOSUN® ALD systems have performed flawlessly and have allowed us to carry out many ALD growth studies with a diverse range of new precursors.”
    Prof. Charles Winter
    Wayne State University, Detroit, USA
    “Before purchasing our ALD system we carefully investigated several alternatives. In the PICOSUN® system we found many advantages over the others. For making good devices, good thermal stability and very uniform deposition are essential. We also love the handy operation system. Picosun provides us high quality products, friendly and appropriate advice, and good after sales support. We are very satisfied with our ALD tool and we recommend PICOSUN® systems to all research institutes to manufacture high quality ALD films and to companies just to utilize the good research results.”
    Dr. Yuichi Harada
    NTT Basic Research Laboratories, Atsugi, Japan
    “The engineering and layout of the PICOSUN® ALD system are very impressive. The Picohot™ heated sources open up a huge number of potential material research areas. I would recommend Picosun’s ALD equipment to everyone who needs a versatile thin film deposition tool for cutting-edge materials fabrication.”
    Dr. Peter King
    Newcastle University, United Kingdom
    Contact us for more information or a quote

    Contact us for more information or a quote