PICOSUN® R-200 Standard

The PICOSUN® R-200 Standard ALD systems are suitable for R&D on dozens of applications such as IC components, MEMS devices, displays, LEDs, lasers, and 3D objects such as lenses, optics, jewelry, coins, and medical implants.

Products

Technical Features

Typical substrate size and type

50–200 mm single wafers
156 mm x 156 mm solar Si wafers
3D objects
Powders and particles
Mini-batch
Porous, through-porous, and high aspect ratio (up to 1:2500)

Processing temperature

50 – 500°C

Typical processes

Al₂O₃, TiO₂, SiO₂, Ta₂O₅, HfO₂, ZnO, ZrO₂, TiN, AlN, metals such as Pt or Ir

Substrate loading

Manual loading with a pneumatic lift
Load lock with magnetic manipulator arm

Precursors

Liquid, solid, gas, ozone
Up to 6 sources with 4 separate inlets

Options

Picoflow™ diffusion enhancer, RGA, N2 generator, gas scrubber, customized designs, glove box compatibility for inert loading

The PICOSUN® R-200 Standard ALD system is the market leader in thermal ALD research tools. It has become the tool of choice both for companies and research institutes driven by innovation.

The agile design enables the highest quality ALD film depositions together with the ultimate flexibility of the system to fit future needs and applications. The patented hot-wall design with fully separate inlets and instrumentation enables particle-free processing adaptable on a wide range of materials on wafers, 3D objects, and all nanoscale features. Excellent uniformity even on the most challenging through-porous, ultra-high aspect ratio, and nanoparticle samples can be achieved thanks to our proprietary Picoflow™ technology. The PICOSUN® R-200 Standard systems are equipped with highly functional and easily exchangeable precursor sources for liquid, gaseous, and solid chemicals. Integration with glove boxes, powder chambers, and various in situ analytics systems enable efficient and flexible research with good results, no matter what your research area is now, or what it might become later on.

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Customer Testimonials

“Since I started working in the field of ALD I have always been positively surprised and satisfied by the response and availability of the Picosun team. We have a lot of exchange about the process parameters, the reactor parts, and the different possibilities offered by some specific precursors. At the beginning, Picosun team took time to properly explain all the details of the system and to recommend what equipment was the best for our purposes. It made us trust that the after sales service would also be up to our expectations. Moreover, the computer interface of the PICOSUN® ALD reactor is very intuitive, the handling of the reactor is simple and the precursor sources are easily accessible which makes their replacement quick and safe. I would recommend Picosun to all scientists and manufacturers who are interested in the ALD technology. The PICOSUN® ALD tool is very easy to use but at the same time powerful enough allowing one to master very complex processes.”

Mr. David Grange, Institute of Applied Microtechnologies, HE-Arc, La Chaux-de-Fonds, Switzerland

“Obviously the Picosun ALD systems show a high degree of design and engineering resulting in reliable systems. Also we have to mention Picosun’s customer service is second to none with prompt replies addressing the various (technical and process) issues we, as users, come up with. We would warmly recommend PICOSUN® ALD tools to our Australian colleagues in research institutes or in industry. We are confident that through our large user base the impact of the Picosun ALD on their research is also transmitted overseas through their collaborators and networks. One of the key advantages of PICOSUN® ALD systems is that the plasma and thermal depositions can be done in the same outfit without any hardware modifications. Moreover, the software is user friendly and it offers one of the most outstanding features, namely the boost function to be used particularly with high aspect ratio nanostructures.”

Dr. Kaushal Vora and Dr. Fouad Karouta, The Australian National University

“Before purchasing our ALD system we carefully investigated several alternatives. In the PICOSUN® system we found many advantages over the others. For making good devices, good thermal stability and very uniform deposition are essential. We also love the handy operation system. Picosun provides us high quality products, friendly and appropriate advice, and good after sales support. We are very satisfied with our ALD tool and we recommend PICOSUN® systems to all research institutes to manufacture high quality ALD films and to companies just to utilize the good research results.”

Dr. Yuichi Harada, NTT Basic Research Laboratories, Atsugi, Japan

“We have chosen an ALD system from Picosun because of the possibility of its fulfillment in the UHV version”

Dr. Andrey M. Markeev, Moscow Institute of Physics and Technology, Moscow, Russia

“In the past five years, our PICOSUN® ALD systems have performed flawlessly and have allowed us to carry out many ALD growth studies with a diverse range of new precursors.”

Prof. Charles Winter, Wayne State University, Detroit, USA

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PICOSUN® R-200 Standard

Products

Technical Features

Customer Testimonials

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