Optimizing optical coatings with MgF2 ALD
To facilitate demanding optical coatings, ALD MgF2 coatings were successfully developed using a commercially available ALD reactor, Picosun R-200 Advanced in a joint R&D project by Shincron and Picosun.
There has been an explosion in commercial demand for handheld and wall-mounted display devices as well as integrated screen technology in the automotive, aerospace and medical industry sectors. Enabling these device types requires a thin film coating method that delivers precision thickness, 3D conformality and the option to tailor the optical material properties of the film.
ALD is a perfect coating solution for optics and display manufacturing since it is functional even on a nanoscopic scale. ALD can be utilized for moisture barriers and insulators, phosphor layers, antireflection, wave guides, optical filters, and tuning of colors.
Our ALD processes offer excellent uniformity, thickness control, particle performance, and film quality even for the most demanding applications. Such demanding areas range from flexible films for passivation to antireflective or black layers. Using Picosun’s proprietary ALD technology, metals, oxides and nitrides are deposited in our fast batch systems with superior uniformity over a large area. Low-temperature processing of pinhole-free films ensures outstanding moisture and oxygen barrier properties even on organic substrates.
To facilitate demanding optical coatings, ALD MgF2 coatings were successfully developed using a commercially available ALD reactor, Picosun R-200 Advanced in a joint R&D project by Shincron and Picosun.
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© Copyright 2021 Picosun Oy. Picosun is a trademark or registered trademark of Picosun Oy | Privacy Statement