Research
Solutions and applications

Taking ALD where it has never been before – together with the ALD community

Our mission is to take ALD where it has never been before and to enable a whole new generation of disruptive ALD-based solutions throughout the industrial field. We work with the leading semiconductor, microelectronics, and medical companies, and collaborate and network with the world’s top universities and research institutes. We participate actively in international research programmes such as EU’s Horizon 2020 and PENTA. The mission is to develop ALD technology for e.g. remote healthcare and safer medical devices, smart power and sustainable industrial manufacturing, and next generation computing, mobile communications and data transfer.

Excellent ALD film quality and operational flexibility 

Our PICOSUN® R-series ALD tools are market leaders in R&D ALD systems. They are used in the world’s leading universities, research organizations and corporations alike. Our customers work in basic research as well as new product development on a wide variety of applications, from semiconductor devices to flexible electronics, quantum computing, future lighting solutions, sustainable energy production, advanced pharmaceuticals, and aerospace engineering. 

The beauty of all PICOSUN® ALD systems is their common core design, which makes results achieved in the R-series R&D tools easily upscalable to production in PICOSUN® P-series, Morpher or Sprinter systems.

PICOSUN® R-series ALD tools are famous for the excellent quality ALD films they produce and for their operational flexibility. PICOSUN® R-series reactors are extremely reliable, easy to use and fast to maintain and service. They have a long service life.

R-series tools can be fitted with plasma and ozone sources, precursor sources for solid, liquid and gaseous chemicals, as well as several in situ analysis equipment such as an ellipsometer, RGA and QCM. Their interchangeable reaction chambers enable deposition on single wafers, small wafer batches, non-wafer 3D objects, and even powdery substances all within the same reactor frame.

The R-series reactors can be made UHV compatible by using special construction materials, and they can be connected to glove boxes with various alternative connection schemes depending on the reactor type.

Related content

• PicoPeriodic Article Bank - Search articles from a selection of publications based on research carried out with Picosun ALD tools
• Press release: Breakthrough in ALD-graphene by Picosun technology 
• Press release: Picosun and Carleton strike gold with ALD 

Publications based on Picosun products: 

Chemical precursors

• Resolving impurities in atomic layer deposited aluminum nitride through low cost, high efficiency precursor design 

Flexible electronics

• Barrier properties of plastic films coated with an Al₂O₃ layer by roll-to-toll atomic layer deposition 

Graphene

• Excellent Wetting Behavior of Yttria on 2D Materials 

In-situ analytics

• Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition 

Nanotechnology

• Precise pore size tuning and surface modifications of polymeric membranes using the atomic layer deposition technique 

Photovoltaics research

• High-Efficiency Solar Cells from Extremely Low Minority Carrier Lifetime Substrates Using Radial Junction Nanowire Architecture 

Powder ALD

• ALD Grown Aluminum Oxide Submonolayers in Dye-Sensitized Solar Cells: The Effect on Interfacial Electron Transfer and Performance 

Quantum 

• Improved critical temperature of superconducting plasma-enhanced atomic layer deposition of niobium nitride thin films by thermal annealing 

UHV clusters

• Resistance Switching Peculiarities in Nonfilamentary Self-Rectified TiN/Ta₂O₅/Ta and TiN/HfO₂/Ta₂O₅/Ta Stacks