As the forerunners of ALD, spearheading ALD research and innovation is at the heart of everything we do at Picosun.
We invest a significant portion of our turnover into R&D – almost a fifth during the last fiscal year. We were also amongst the ten Finnish companies that filed the most patent applications with the European Patent Office during 2020.
Our mission is to take ALD where it has never been before and to enable a whole new generation of disruptive ALD-based solutions throughout the industrial field. We work with the leading semiconductor, microelectronics, and medical companies, and collaborate and network with the world’s top universities and research institutes. We participate actively in international research programmes such as EU’s Horizon 2020 and PENTA. The mission is to develop ALD technology for e.g. remote healthcare and safer medical devices, smart power and sustainable industrial manufacturing, and next generation computing, mobile communications and data transfer.
Our PICOSUN® R-series ALD tools are market leaders in R&D ALD systems. They are used in the world’s leading universities, research organizations and corporations alike. Our customers work in basic research as well as new product development on a wide variety of applications, from semiconductor devices to flexible electronics, quantum computing, future lighting solutions, sustainable energy production, advanced pharmaceuticals, and aerospace engineering.
The beauty of all PICOSUN® ALD systems is their common core design, which makes results achieved in the R-series R&D tools easily upscalable to production in PICOSUN® P-series, Morpher or Sprinter systems.
PICOSUN® R-series ALD tools are famous for the excellent quality ALD films they produce and for their operational flexibility. PICOSUN® R-series reactors are extremely reliable, easy to use and fast to maintain and service. They have a long service life.
R-series tools can be fitted with plasma and ozone sources, precursor sources for solid, liquid and gaseous chemicals, as well as several in situ analysis equipment such as an ellipsometer, RGA and QCM. Their interchangeable reaction chambers enable deposition on single wafers, small wafer batches, non-wafer 3D objects, and even powdery substances all within the same reactor frame.
The R-series reactors can be made UHV compatible by using special construction materials, and they can be connected to glove boxes with various alternative connection schemes depending on the reactor type.