Research
    Solutions and applications

    As the forerunners of ALD, spearheading ALD research and innovation is at the heart of everything we do at Picosun.

    We invest a significant portion of our turnover into R&D – almost a fifth during the last fiscal year. We were also amongst the ten Finnish companies that filed the most patent applications with the European Patent Office during 2020.

    Taking ALD where it has never been before – together with the ALD community

    Our mission is to take ALD where it has never been before and to enable a whole new generation of disruptive ALD-based solutions throughout the industrial field. We work with the leading semiconductor, microelectronics, and medical companies, and collaborate and network with the world’s top universities and research institutes. We participate actively in international research programmes such as EU’s Horizon 2020 and PENTA. The mission is to develop ALD technology for e.g. remote healthcare and safer medical devices, smart power and sustainable industrial manufacturing, and next generation computing, mobile communications and data transfer.

    Excellent ALD film quality and operational flexibility 

    Our PICOSUN® R-series ALD tools are market leaders in R&D ALD systems. They are used in the world’s leading universities, research organizations and corporations alike. Our customers work in basic research as well as new product development on a wide variety of applications, from semiconductor devices to flexible electronics, quantum computing, future lighting solutions, sustainable energy production, advanced pharmaceuticals, and aerospace engineering. 

    The beauty of all PICOSUN® ALD systems is their common core design, which makes results achieved in the R-series R&D tools easily upscalable to production in PICOSUN® P-series, Morpher or Sprinter systems.

    PICOSUN® R-series ALD tools are famous for the excellent quality ALD films they produce and for their operational flexibility. PICOSUN® R-series reactors are extremely reliable, easy to use and fast to maintain and service. They have a long service life.

    R-series tools can be fitted with plasma and ozone sources, precursor sources for solid, liquid and gaseous chemicals, as well as several in situ analysis equipment such as an ellipsometer, RGA and QCM. Their interchangeable reaction chambers enable deposition on single wafers, small wafer batches, non-wafer 3D objects, and even powdery substances all within the same reactor frame.

    The R-series reactors can be made UHV compatible by using special construction materials, and they can be connected to glove boxes with various alternative connection schemes depending on the reactor type.

    Related content

    Publications based on Picosun products: 

    Chemical precursors

    Flexible electronics

    Graphene

    In-situ analytics

    Nanotechnology

    Photovoltaics research

    Powder ALD

    Quantum 

    UHV clusters

    Customer testimonials

    ”The good performance of Picosun’s ALD technology is well-known and trusted. We learned about Picosun through our industrial co-workers in LED manufacturing and the high technological quality and great achievements of the PICOSUN® ALD systems motivated us to select one ourselves. Picosun’s ALD equipment have demonstrated remarkable and reliable performance for electronic devices and optoelectronics production which is why we greatly recommend the semiconductor industries (for example Si-based FinFET, CMOS, LED, and display manufacturers) to consider PICOSUN® ALD systems.”
    Prof. Hao-Chung Kuo
    National Chiao Tung University (NCTU), Taiwan
    “The Picosun reactors are designed by ALD experts for a single purpose to do ALD. I would recommend Picosun to anyone who is looking for production-proven and optimized, leading quality ALD solutions for their manufacturing needs, provided by the true experts of the technology. Picosun covers the complete spectrum of ALD tools from basic R&D equipment to process transfer to productive, industrial-scale platforms like batch chambers that can also be clustered for automatic wafer processing in a wafer fab production.”
    Dr. Jonas Sundqvist
    Lund University, Sweden
    “Picosun is one of the leaders in the field of ALD. They have strong experience in the development of ALD equipment and in the ALD processes. When we have questions about the ALD system or the ALD processes we always have competent people to answer our questions. PICOSUN® ALD systems can be used in all MEMS and other microelectronics applications, both in research and in industries, with a large range of materials that can be deposited.”
    Dr. Lionel Rousseau
    ESIEE-Paris, France
    “The fact that Picosun has been involved in the ALD industry since its infancy speaks volumes about their technical expertise and the learning curve that’s gone into designing the tool. I would recommend the PICOSUN® R-series platform to any academic or national laboratory looking to do thin film research. Operationally, the system is both flexible and robust enough to meet the demands of a highly technical, multiple user facility.”
    Mr. Bryant Colwill
    Rensselaer Polytechnic Institute, Troy, New York, USA
    “We are impressed with the excellent customer support provided by Picosun, the excellent quality of our PICOSUN® ALD system, and its simple, clear, intuitive, and secure software. We have installed our PICOSUN® system at our university and we would recommend it to any academic institute carrying out cutting-edge research in nanotechnology and related areas. This is the smallest PICOSUN® system. For production purposes one should consider a bigger PICOSUN® system with options for automated operation.”
    Prof. Peter Lemmens and Dr. Andrey Bakin
    University of Technology in Braunschweig, Germany
    “I have known Picosun for about eight years, and I have always been impressed with this company. They have a real enthusiasm and commitment to ALD, and the staff is open and friendly and easy-going. I would recommend the PICOSUN® R-series tool to any researcher in the field of ALD. I am always confident of the support I will get from Picosun.”
    Prof. Seán Barry
    Carleton University, Ottawa, Canada
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